The SPC150 is a high-vacuum plasma cleaner featuring three independently controlled gas lines with mass flow controllers (MFCs), enabling precise and repeatable gas-flow regulation. An integrated grid positioned between the ion source and sample chamber delivers a gentler plasma environment, making the system especially effective for removing hydrocarbon and silicon contamination from ultrathin carbon films and other sensitive samples.

In addition, the SPC150 supports in situ plasma treatment of TEM sample holders and cell chips, as well as in situ vacuum leak detection for TEM holders, helping ensure optimal sample cleanliness and preparation integrity prior to microscopy analysis.